The Medea+ FANTASTIC project, addresses the development and assessment of UV-Nanoimprint lithography for high resolution and high throughput microelectronic applications.
Nanoimprint technology has claimed to be a competitive candidate for Next Generation Lithography due to its advantages concerning resolution and cost effectiveness. The potential of this technology has been acknowledged by leading experts and therefore added to the Semiconductor Technology Roadmap (ITRS) as a prospective NGL tool for microelectronics at the 32 nm node and beyond.
The project will investigate all aspects of the technology involved:
- Tools for manufacturing,
- Imprint process technology,
- Templates fabrication, including patterning, inspection and repair and
- Integration into industrial process lines.
Main equipments suppliers, maskshops, institutes involved in nanoimprint activities are partners of the project. The assessment of the technology will be driven by the leading European IC manufacturers.
This project is planed for a 2 and half year period and has started in August 2006.
